WebUniversity of California, Berkeley WebApr 10, 2024 · First time investigates the effect of Dual Metal on Gate Junctionless Nanosheet FET (DMG-JL-NSFET) for analog/RF applications. • The entire analysis is performed for gate length (L g) = 16 nm at 10μA/μm to focus the weak/moderate inversion region of operation.. A whooping amount of reduction in terms of output conductance (g …
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Graphene field-effect transistors with high extrinsic fT and fmax
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